INFICON, INC.
Patent Owner
Stats
- 22 US PATENTS IN FORCE
- 2 US APPLICATIONS PENDING
- Aug 17, 2017 most recent publication
Details
- 22 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 351 Total Citation Count
- Dec 26, 1991 Earliest Filing
- 8 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9506895 Combined crystal retainer and contact system for deposition monitor sensorsMay 17, 13Nov 29, 16[H01L, G01N, G01R]
9217663 Multi-chambered acoustic sensor for determination gas compositionNov 21, 12Dec 22, 15[G01H, G01N]
9182378 High capacity monitor crystal exchanger utilizing an organized 3-D storage structureMar 15, 13Nov 10, 15[B05C, G01N]
8438924 Method of determining multilayer thin film deposition on a piezoelectric crystalFeb 03, 11May 14, 13[G01N]
7538562 High performance miniature RF sensor for use in microelectronics plasma processing toolsMar 19, 07May 26, 09[G01R]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2010/0171,505 Supplemental air system for a portable, instrinsically safe, flame ionization detector (FID) deviceAbandonedNov 19, 09Jul 08, 10[G01N]
2010/0171,506 Explosion-proof detector assembly for a flame ionization detector (FID)AbandonedNov 19, 09Jul 08, 10[G01N, G01R]
2010/0172,796 Metal hydride storage system for a portable, intrinsically safe, flame ionization detector (FID) deviceAbandonedNov 19, 09Jul 08, 10[G01N]
2010/0173,185 Battery pack assembly for an intrinsically safe deviceAbandonedNov 19, 09Jul 08, 10[H01M]
2009/0014,644 IN-SITU ION SOURCE CLEANING FOR PARTIAL PRESSURE ANALYZERS USED IN PROCESS MONITORINGAbandonedJul 10, 08Jan 15, 09[B01D]
6906799 Signal processing method for in-situ, scanned-beam particle monitoringExpiredSep 09, 02Jun 14, 05[G01N]
5943130 In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipmentExpiredOct 21, 96Aug 24, 99[G01N]
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